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Soft X-Rays & Extreme Ultraviolet Radiation: Principles Applications Attwood HC
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(6909)
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US $85,00
CircaEUR 72,83
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Condizione:
“VERY clean hardcover”
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US $5,97 (circa EUR 5,12) spedizione in 2-4 giorni
Ricevilo tra il sab 6 dic e il mar 9 dic a 94104.
Oggetto che si trova a: Valencia, California, Stati Uniti
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Informazioni sull'oggetto
Il venditore si assume la piena responsabilità della messa in vendita dell'oggetto.
Numero oggetto eBay:167964619153
Specifiche dell'oggetto
- Condizione
- Ottime condizioni
- Note del venditore
- “VERY clean hardcover”
- ISBN
- 9780521652148
Informazioni su questo prodotto
Product Identifiers
Publisher
Cambridge University Press
ISBN-10
0521652146
ISBN-13
9780521652148
eBay Product ID (ePID)
1094912
Product Key Features
Number of Pages
486 Pages
Language
English
Publication Name
Soft X-Rays and Extreme Ultraviolet Radiation : Principles and Applications
Subject
Radiation, Electronics / Optoelectronics
Publication Year
1999
Type
Textbook
Subject Area
Technology & Engineering, Science
Format
Hardcover
Dimensions
Item Height
1.1 in
Item Weight
37.4 Oz
Item Length
10.3 in
Item Width
7.2 in
Additional Product Features
Intended Audience
College Audience
LCCN
99-021078
Dewey Edition
21
Reviews
"The region of the electromagnetic spectrum covered by this excellently written and produced book has only become available to exploitation over the last couple of decades or so...every researcher, teacher and student involved with the generation, manipulation or applications of electromagnetic radiation in this part of the spectrum should make space on their desk (not the bookshelf, since it won't spend much time there!) for this wonderful addition to the literature." Contemporary Physics, '... excellently written and produced book ... David Attwood is a respected teacher and renowned researcher in all of the topics covered in this book, and is to be congratulated on its timely publication ... there is no doubt in my mind that it will very quickly become a primary source for beginning graduate students (and high level undergraduates) and experienced researchers alike ... Unusually, I cannot think of any way in which the book could be improved. It is comprehensive and enjoyable to read, the figures are illustrative and clearly drawn and the mathematics is at an appropriate level for the intended readership ... it will serve as [an] important reference source as well as a teacher's and researcher's handbook ... I shall certainly be using this book in my future teaching and recommending it to advanced students.' A. Michette, Contemporary Physics
Illustrated
Yes
Dewey Decimal
539.7/222
Table Of Content
1. Introduction; 2. Radiation and scattering at EUV and soft X-ray wavelengths; 3. Wave propagation and refractive index at EUV and soft X-ray wavelengths; 4. Multilayer interference coatings; 5. Synchrotron radiation; 6. Physics of hot-dense plasmas; 7. Extreme ultraviolet and soft X-ray lasers; 8. Coherence at short wavelengths; 9. X-Ray microscopy with diffractive optics; 10. Extreme ultraviolet and X-ray lithography; Appendices.
Synopsis
This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science., This comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science., This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers., This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
LC Classification Number
QC482.G68 A88 1999
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